Plasma etching in semiconductor fabrication /

Plasma etching in semiconductor fabrication /

40

Bibliographic Details
Main Author:	217469 Morgan, Russ A.
Format:
Published:	Amsterdam : Elservier, 1985
Subjects:	Plasma etching Semiconductors

Similar Items

Studies of the chemistry of plasmas used for semiconductor etching
by: Toogood, M, et al.
Published: (1991)

Plasma processes for semiconductor fabrication /
by: 414824 Hitchon, W. Nicholas G.
Published: (1999)

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
by: Rossnagel, Stephen M., et al.
Published: (1990)

Dry etching for VLSI /
by: 198063 Roosmalen, A. J. Van, et al.
Published: (1991)

Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers
by: Jakub Dranczewski, et al.
Published: (2023-06-01)

RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors
by: Dudin S. V., et al.
Published: (2011-04-01)

Plasma technology in wool /
by: Kan, C. W., et al.
Published: (2007)

Studies on etching and polymer deposition in halocarbon plasmas
by: Astell-Burt, P, et al.
Published: (1987)

End point prediction in wet etching, cleaning, and rinsing of microstructures in semiconductor manufacturing
by: Calliandra Stuffle, et al.
Published: (2022-08-01)

Etching performance of silicon wafers with redesigned etching drum : An Approach to Etching Optimization /
by: Rozzeta Dolah, author, et al.
Published: (2012)

Etching performance of silicon wafers with redesigned etching drum /
by: 186505 Rozzeta Dolah, et al.
Published: (2006)

Etching performance of silicon wafers with redesigned etching drum [electronic resource] /
by: 186505 Rozzeta Dolah, et al.
Published: (2006)

Applications of plasma processes to VLSI technology/
by: Sugano, Takuo
Published: (1985)

Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment
by: Ching-Ming Ku, et al.
Published: (2022-06-01)

RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
by: T. A. Ismailov, et al.
Published: (2016-07-01)

Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance
by: Yu-Bin Shin, et al.
Published: (2025-01-01)

Towards atomic-scale smooth surface manufacturing of β-Ga2O3 via highly efficient atmospheric plasma etching
by: Yongjie Zhang, et al.
Published: (2024-01-01)

The versatile technique of RF plasma etching : the etch profile /
by: 427692 Jacob, Adir

A review of the mechanism and optimization of metal-assisted chemical etching and applications in semiconductors
by: Kibum Jung, et al.
Published: (2024-12-01)

Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
by: Qingzhi Li, et al.
Published: (2023-10-01)

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma
by: Inho Seong, et al.
Published: (2022-11-01)

Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF<sub>6</sub>/O<sub>2</sub> Gas Mixture
by: Andrey Miakonkikh, et al.
Published: (2024-05-01)

Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions
by: Ho Jin Ma, et al.
Published: (2024-03-01)

Manipulation of the Superhydrophobicity of Plasma-Etched Polymer Nanostructures
by: Ke Du, et al.
Published: (2018-06-01)

Digital Etching of Molybdenum Interconnects Using Plasma Oxidation
by: Ivan Erofeev, et al.
Published: (2025-01-01)

Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS)
by: Guilherme Sombrio, et al.
Published: (2021-04-01)

Study of Atmospheric Pressure Plasma Temperature Based on Silicon Carbide Etching
by: Shaozhen Xu, et al.
Published: (2023-05-01)

Supervised Multivariate Kernel Density Estimation for Enhanced Plasma Etching Endpoint Detection
by: Jungyu Choi, et al.
Published: (2022-01-01)

Investigation into SiO<sub>2</sub> Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
by: Won-nyoung Jeong, et al.
Published: (2022-12-01)

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO<sub>2</sub>
by: Youngseok Lee, et al.
Published: (2022-08-01)

Simulation of etching process for IC fabrication /
by: 442678 Wong, Kit Seong
Published: (2003)

Precise in situ etch depth control of multilayered III−V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment
by: Ann-Kathrin Kleinschmidt, et al.
Published: (2016-11-01)

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching
by: Manuel R. Gonçalves, et al.
Published: (2011-08-01)

The versatile technique of Rf plasma etching : mechanistic considerations for selective etching /
by: 427692 Jacob, Adir

Plasma etching and surface characteristics depending on the crystallinity of the BaTiO3 thin film
by: Han Byeol Lee, et al.
Published: (2023-01-01)

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching
by: Lihao Wang, et al.
Published: (2020-06-01)

Selective Plasma Etching of Polymeric Substrates for Advanced Applications
by: Harinarayanan Puliyalil, et al.
Published: (2016-06-01)

Database Development of SiO<sub>2</sub> Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
by: Youngseok Lee, et al.
Published: (2022-10-01)

Analysis of silicon surfaces etched in aqueous HF-(HBr)–Br2-mixtures
by: Nils Schubert, et al.
Published: (2024-08-01)

Formation Mechanism of Rounded SiGe-Etch Front in Isotropic SiGe Plasma Etching for Gate-All-Around FETs
by: Yu Zhao, et al.
Published: (2021-01-01)