A review on morphotropic phase boundary in fluorite-structure hafnia towards DRAM technology

Abstract In the present hyper-scaling era, memory technology is advancing owing to the demand for high-performance computing and storage devices. As a result, continuous work on conventional semiconductor-process-compatible ferroelectric memory devices such as ferroelectric field-effect transistors,...

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Bibliographic Details
Main Authors: Minhyun Jung, Venkateswarlu Gaddam, Sanghun Jeon
Format: Article
Language:English
Published: SpringerOpen 2022-10-01
Series:Nano Convergence
Subjects:
Online Access:https://doi.org/10.1186/s40580-022-00333-7