Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity

Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity

Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among many material components. Herein, we investiga...

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Bibliographic Details
Main Authors: Ji Young Park, Hyun-Ji Song, Thanh Cuong Nguyen, Won-Joon Son, Daekeon Kim, Giyoung Song, Suk-Koo Hong, Heeyoung Go, Changmin Park, Inkook Jang, Dae Sin Kim
Format: Article
Language:English
Published: MDPI AG 2023-08-01
Series:Molecules
Subjects:
photoacid generator (PAG)
acid-generation mechanism
chemical amplified resist (CAR)
triphenylsulfonium (TPS)
extreme ultraviolet (EUV) photoresist
Online Access:https://www.mdpi.com/1420-3049/28/17/6244

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https://www.mdpi.com/1420-3049/28/17/6244

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