Molecular Dynamics Simulation of Laser Induced Heating of Silicon Dioxide Thin Films

Molecular Dynamics Simulation of Laser Induced Heating of Silicon Dioxide Thin Films

The full-atomistic classical molecular dynamics simulation of the laser heating of silicon dioxide thin films is performed. Both dense isotropic films and porous anisotropic films are investigated. It is assumed that heating occurs due to nodal structural defects, which are currently considered one...

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Bibliographic Details
Main Authors: Fedor Vasilievich Grigoriev, Vladimir Borisovich Sulimov, Alexander Vladimirovich Tikhonravov
Format: Article
Language:English
Published: MDPI AG 2021-11-01
Series:Nanomaterials
Subjects:
thin films
molecular dynamics
silicon dioxide films
laser induced damage
Online Access:https://www.mdpi.com/2079-4991/11/11/2986

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https://www.mdpi.com/2079-4991/11/11/2986

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