The use of one-component plasma in the icp-rie etching process of periodic structures for applications in photodetector arrays
The paper presents the effect of ICP-RIE etching time using one-component plasma on various parameters of an InAs/GaSb type II superlattice matrix. In the studies, two samples used at different BCl3 gas flow rates were compared and it was found that using a lower flow rate of 7 sccm results in obtai...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Polish Academy of Sciences
2023-11-01
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| Series: | Metrology and Measurement Systems |
| Subjects: | |
| Online Access: | https://journals.pan.pl/Content/130315/art13_int.pdf |