Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Abstract Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning...

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Bibliographic Details
Main Authors: Xiaoli Tian, Fu Li, Zhenyuan Tang, Song Wang, Kangkang Weng, Dan Liu, Shaoyong Lu, Wangyu Liu, Zhong Fu, Wenjun Li, Hengwei Qiu, Min Tu, Hao Zhang, Jinghong Li
Format: Article
Language:English
Published: Nature Portfolio 2024-04-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-024-47293-6

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https://doi.org/10.1038/s41467-024-47293-6

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