Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
Abstract Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning...
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2024-04-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-024-47293-6 |
| _version_ | 1797219707792654336 |
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| author | Xiaoli Tian Fu Li Zhenyuan Tang Song Wang Kangkang Weng Dan Liu Shaoyong Lu Wangyu Liu Zhong Fu Wenjun Li Hengwei Qiu Min Tu Hao Zhang Jinghong Li |
| author_facet | Xiaoli Tian Fu Li Zhenyuan Tang Song Wang Kangkang Weng Dan Liu Shaoyong Lu Wangyu Liu Zhong Fu Wenjun Li Hengwei Qiu Min Tu Hao Zhang Jinghong Li |
| author_sort | Xiaoli Tian |
| collection | DOAJ |
| description | Abstract Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning methods. However, existing MOF patterning methods suffer from some combinations of limited material adaptability, compromised patterning resolution and scalability, and degraded properties. Here we report a universal, crosslinking-induced patterning approach for various MOFs, termed as CLIP-MOF. Via resist-free, direct photo- and electron-beam (e-beam) lithography, the ligand crosslinking chemistry leads to drastically reduced solubility of colloidal MOFs, permitting selective removal of unexposed MOF films with developer solvents. This enables scalable, micro-/nanoscale (≈70 nm resolution), and multimaterial patterning of MOFs on large-area, rigid or flexible substrates. Patterned MOF films preserve their crystallinity, porosity, and other properties tailored for targeted applications, such as diffractive gas sensors and electrochromic pixels. The combined features of CLIP-MOF create more possibilities in the system-level integration of MOFs in various electronic, photonic, and biomedical devices. |
| first_indexed | 2024-04-24T12:37:56Z |
| format | Article |
| id | doaj.art-02a6a6aed69f43d89f71e4470e55cdc2 |
| institution | Directory Open Access Journal |
| issn | 2041-1723 |
| language | English |
| last_indexed | 2024-04-24T12:37:56Z |
| publishDate | 2024-04-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj.art-02a6a6aed69f43d89f71e4470e55cdc22024-04-07T11:23:54ZengNature PortfolioNature Communications2041-17232024-04-0115111510.1038/s41467-024-47293-6Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithographyXiaoli Tian0Fu Li1Zhenyuan Tang2Song Wang3Kangkang Weng4Dan Liu5Shaoyong Lu6Wangyu Liu7Zhong Fu8Wenjun Li9Hengwei Qiu10Min Tu11Hao Zhang12Jinghong Li13Department of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityShanghai Institute of Microsystem and Information Technology, Chinese Academy of SciencesDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityShanghai Institute of Microsystem and Information Technology, Chinese Academy of SciencesDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityDepartment of Chemistry, Center for Bioanalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua UniversityAbstract Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning methods. However, existing MOF patterning methods suffer from some combinations of limited material adaptability, compromised patterning resolution and scalability, and degraded properties. Here we report a universal, crosslinking-induced patterning approach for various MOFs, termed as CLIP-MOF. Via resist-free, direct photo- and electron-beam (e-beam) lithography, the ligand crosslinking chemistry leads to drastically reduced solubility of colloidal MOFs, permitting selective removal of unexposed MOF films with developer solvents. This enables scalable, micro-/nanoscale (≈70 nm resolution), and multimaterial patterning of MOFs on large-area, rigid or flexible substrates. Patterned MOF films preserve their crystallinity, porosity, and other properties tailored for targeted applications, such as diffractive gas sensors and electrochromic pixels. The combined features of CLIP-MOF create more possibilities in the system-level integration of MOFs in various electronic, photonic, and biomedical devices.https://doi.org/10.1038/s41467-024-47293-6 |
| spellingShingle | Xiaoli Tian Fu Li Zhenyuan Tang Song Wang Kangkang Weng Dan Liu Shaoyong Lu Wangyu Liu Zhong Fu Wenjun Li Hengwei Qiu Min Tu Hao Zhang Jinghong Li Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography Nature Communications |
| title | Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography |
| title_full | Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography |
| title_fullStr | Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography |
| title_full_unstemmed | Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography |
| title_short | Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography |
| title_sort | crosslinking induced patterning of mofs by direct photo and electron beam lithography |
| url | https://doi.org/10.1038/s41467-024-47293-6 |
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