Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts

Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts

A series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and FTIR spectroscopies were used to characterize the...

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Bibliographic Details
Main Authors: Jacek TYCZKOWSKI, Ryszard KAPICA, Wiktor REDZYNIA, Marcin KOZANECKI, Mohamed M. CHEHIMI, Jan SIELSKI, Sławomir M. KUBERSKI
Format: Article
Language:English
Published: Kaunas University of Technology 2013-09-01
Series:Medžiagotyra
Subjects:
plasma deposition
copper-doped cobalt oxide catalysts
Raman spectroscopy
X-ray photoelectron spectroscopy
energy dispersive X-ray microanalysis
Online Access:http://matsc.ktu.lt/index.php/MatSc/article/view/2320

Internet

http://matsc.ktu.lt/index.php/MatSc/article/view/2320

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