Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts
A series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and FTIR spectroscopies were used to characterize the...
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| Format: | Article |
| Language: | English |
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Kaunas University of Technology
2013-09-01
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| Series: | Medžiagotyra |
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| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/2320 |
| _version_ | 1819089359021801472 |
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| author | Jacek TYCZKOWSKI Ryszard KAPICA Wiktor REDZYNIA Marcin KOZANECKI Mohamed M. CHEHIMI Jan SIELSKI Sławomir M. KUBERSKI |
| author_facet | Jacek TYCZKOWSKI Ryszard KAPICA Wiktor REDZYNIA Marcin KOZANECKI Mohamed M. CHEHIMI Jan SIELSKI Sławomir M. KUBERSKI |
| author_sort | Jacek TYCZKOWSKI |
| collection | DOAJ |
| description | A series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and FTIR spectroscopies were used to characterize the chemical structure and morphology of the produced films. The bulk composition and homogeneity of the samples were investigated by energy dispersive X-ray microanalysis (EDX), and X-ray photoelectron spectroscopy (XPS) was employed to assess the surface chemical composition of pure and doped materials. The obtained results permit to affirm that the PEMOCVD technique is a simple, versatile and efficient method for providing homogeneous layers of cobalt oxides with a different content of copper. It has been found that pure cobalt oxide films mainly contain Co<sub>3</sub>O<sub>4</sub> in the form of nanoclusters whereas the films doped with Cu are much more complex, and CoO<sub>x</sub> (also Co<sub>3</sub>O<sub>4</sub>), mixed Co-Cu oxides and CuO<sub>x</sub> nanoclusters are detected in them. Preliminary catalytical tests show that Cu-doped cobalt oxide films allow to initiate catalytic combustion of n-hexane at a lower temperature compared to the pure cobalt oxide (Co<sub>3</sub>O<sub>4</sub>) films. From what has been stated above, the plasma-deposited thin films of Cu-doped cobalt oxides pave the way towards a new class of nanomaterials with interesting catalytic properties. <p>DOI: <a href="http://dx.doi.org/10.5755/j01.ms.19.3.2320">http://dx.doi.org/10.5755/j01.ms.19.3.2320</a></p> |
| first_indexed | 2024-12-21T22:06:40Z |
| format | Article |
| id | doaj.art-02e364b3ed6a46c7a40881a726ee9178 |
| institution | Directory Open Access Journal |
| issn | 1392-1320 2029-7289 |
| language | English |
| last_indexed | 2024-12-21T22:06:40Z |
| publishDate | 2013-09-01 |
| publisher | Kaunas University of Technology |
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| series | Medžiagotyra |
| spelling | doaj.art-02e364b3ed6a46c7a40881a726ee91782022-12-21T18:48:41ZengKaunas University of TechnologyMedžiagotyra1392-13202029-72892013-09-0119327027610.5755/j01.ms.19.3.23202473Plasma Deposition and Characterization of Copper-doped Cobalt Oxide NanocatalystsJacek TYCZKOWSKI0Ryszard KAPICA1Wiktor REDZYNIA2Marcin KOZANECKI3Mohamed M. CHEHIMI4Jan SIELSKI5Sławomir M. KUBERSKI6Lodz University of TechnologyLodz University of TechnologyLodz University of TechnologyLodz University of TechnologyUniversité Paris DiderotLodz University of TechnologyLodz University of TechnologyA series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and FTIR spectroscopies were used to characterize the chemical structure and morphology of the produced films. The bulk composition and homogeneity of the samples were investigated by energy dispersive X-ray microanalysis (EDX), and X-ray photoelectron spectroscopy (XPS) was employed to assess the surface chemical composition of pure and doped materials. The obtained results permit to affirm that the PEMOCVD technique is a simple, versatile and efficient method for providing homogeneous layers of cobalt oxides with a different content of copper. It has been found that pure cobalt oxide films mainly contain Co<sub>3</sub>O<sub>4</sub> in the form of nanoclusters whereas the films doped with Cu are much more complex, and CoO<sub>x</sub> (also Co<sub>3</sub>O<sub>4</sub>), mixed Co-Cu oxides and CuO<sub>x</sub> nanoclusters are detected in them. Preliminary catalytical tests show that Cu-doped cobalt oxide films allow to initiate catalytic combustion of n-hexane at a lower temperature compared to the pure cobalt oxide (Co<sub>3</sub>O<sub>4</sub>) films. From what has been stated above, the plasma-deposited thin films of Cu-doped cobalt oxides pave the way towards a new class of nanomaterials with interesting catalytic properties. <p>DOI: <a href="http://dx.doi.org/10.5755/j01.ms.19.3.2320">http://dx.doi.org/10.5755/j01.ms.19.3.2320</a></p>http://matsc.ktu.lt/index.php/MatSc/article/view/2320plasma depositioncopper-doped cobalt oxide catalystsRaman spectroscopyX-ray photoelectron spectroscopyenergy dispersive X-ray microanalysis |
| spellingShingle | Jacek TYCZKOWSKI Ryszard KAPICA Wiktor REDZYNIA Marcin KOZANECKI Mohamed M. CHEHIMI Jan SIELSKI Sławomir M. KUBERSKI Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts Medžiagotyra plasma deposition copper-doped cobalt oxide catalysts Raman spectroscopy X-ray photoelectron spectroscopy energy dispersive X-ray microanalysis |
| title | Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts |
| title_full | Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts |
| title_fullStr | Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts |
| title_full_unstemmed | Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts |
| title_short | Plasma Deposition and Characterization of Copper-doped Cobalt Oxide Nanocatalysts |
| title_sort | plasma deposition and characterization of copper doped cobalt oxide nanocatalysts |
| topic | plasma deposition copper-doped cobalt oxide catalysts Raman spectroscopy X-ray photoelectron spectroscopy energy dispersive X-ray microanalysis |
| url | http://matsc.ktu.lt/index.php/MatSc/article/view/2320 |
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