Aluminum doped zinc oxide layers by atomic layer deposition and magnetron sputtering: formation and comparison of optoelectronic properties

Aluminum doped zinc oxide layers by atomic layer deposition and magnetron sputtering: formation and comparison of optoelectronic properties

Thin films of aluminum-doped zinc oxide (AZO) were prepared using magnetron sputtering and atomic layer deposition (ALD) techniques. Atomic force microscopy (AFM) studies of AZO films surface morphology show that the surface of produced by ALDfilms is a smoother in comparison with films formed by ma...

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Bibliographic Details
Main Authors: G.K. Mussabek, К.К. Dikhanbayev, V. Sivakov, F. Talkenberg, S. Sailaubek, А.S. Djunusbekov, G.Ye. Ukenova, А.Ye. Kemelbekova
Format: Article
Language:English
Published: Al-Farabi Kazakh National University 2016-10-01
Series:Physical Sciences and Technology
Subjects:
Key words
zinc oxide
thin films
morphology
optical properties
electrical properties. PACS numbers
Online Access:http://phst/index.php/journal/article/view/57

Internet

http://phst/index.php/journal/article/view/57

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