Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime

Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime

This paper focuses on the power dissipation of a plasma torch used for an optical surface fabrication process. The process utilizes an inductively coupled plasma (ICP) torch that is equipped with a De-Laval nozzle for the delivery of a highly collimated plasma jet. The plasma torch makes use of a se...

Full description

Bibliographic Details
Main Authors: Nan Yu, Renaud Jourdain, Mustapha Gourma, Fangda Xu, Adam Bennett, Fengzhou Fang
Format: Article
Language:English
Published: MDPI AG 2021-07-01
Series:Micromachines
Subjects:
heat transfer
plasma processing
inductively coupled plasma
Online Access:https://www.mdpi.com/2072-666X/12/7/834

Internet

https://www.mdpi.com/2072-666X/12/7/834

Similar Items