A Novel Method for Growing α-Ga<sub>2</sub>O<sub>3</sub> Films Using Mist-CVD Face-to-face Heating Plates

A Novel Method for Growing α-Ga<sub>2</sub>O<sub>3</sub> Films Using Mist-CVD Face-to-face Heating Plates

In this paper, the method for growing α-Ga<sub>2</sub>O<sub>3</sub> films on c-plane sapphire substrates using an inexpensive fine-channel mist-CVD face-to-face heating plate was investigated. Because high temperatures can result in reactor deformation, expensive AlN ceramics...

Full description

Bibliographic Details
Main Authors: Yan Zuo, Qian Feng, Tao Zhang, Xusheng Tian, Wenji Li, Jiale Li, Chunfu Zhang, Jincheng Zhang, Yue Hao
Format: Article
Language:English
Published: MDPI AG 2022-12-01
Series:Nanomaterials
Subjects:
α-Ga<sub>2</sub>O<sub>3</sub> film
mist-CVD
X-ray diffraction
face-to-face
Online Access:https://www.mdpi.com/2079-4991/13/1/72

Internet

https://www.mdpi.com/2079-4991/13/1/72

Similar Items