A Novel Method for Growing α-Ga<sub>2</sub>O<sub>3</sub> Films Using Mist-CVD Face-to-face Heating Plates

A Novel Method for Growing α-Ga<sub>2</sub>O<sub>3</sub> Films Using Mist-CVD Face-to-face Heating Plates

In this paper, the method for growing α-Ga<sub>2</sub>O<sub>3</sub> films on c-plane sapphire substrates using an inexpensive fine-channel mist-CVD face-to-face heating plate was investigated. Because high temperatures can result in reactor deformation, expensive AlN ceramics...

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Bibliographic Details
Main Authors:	Yan Zuo, Qian Feng, Tao Zhang, Xusheng Tian, Wenji Li, Jiale Li, Chunfu Zhang, Jincheng Zhang, Yue Hao
Format:	Article
Language:	English
Published:	MDPI AG 2022-12-01
Series:	Nanomaterials
Subjects:	α-Ga<sub>2</sub>O<sub>3</sub> film mist-CVD X-ray diffraction face-to-face
Online Access:	https://www.mdpi.com/2079-4991/13/1/72

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