Negative index metamaterial at ultraviolet range for subwavelength photolithography

Negative index metamaterial at ultraviolet range for subwavelength photolithography

A negative index metamaterial (NIM) at ultraviolet range is constructed with stacked plasmonic waveguides. Based on the waveguides performing antisymmetric modes, the negative refractions of both wavevector and energy flow are realized when a TM-polarized light with a wavelength of 365 nm incidents...

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Bibliographic Details
Main Authors: Jin Qijian, Liang Gaofeng, Kong Weijie, Liu Ling, Wen Zhongquan, Zhou Yi, Wang Changtao, Chen Gang, Luo Xiangang
Format: Article
Language:English
Published: De Gruyter 2022-03-01
Series:Nanophotonics
Subjects:
negative index metamaterial
plasmonic waveguide
subwavelength photolithography
Online Access:https://doi.org/10.1515/nanoph-2022-0013

Internet

https://doi.org/10.1515/nanoph-2022-0013

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