Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane
In this study, we conducted an experiment in which a source material was sprayed onto a substrate with simultaneous N+ ion beam injections. Hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS) was used as a source material. The energy of N+ ions was set at 100 eV. The substrate temperatur...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2024-09-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0214908 |