An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution

Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corr...

Full description

Bibliographic Details
Main Author: Jagadish Bhattarai
Format: Article
Language:English
Published: Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University 2021-01-01
Series:Bibechana
Subjects:
Online Access:https://www.nepjol.info/index.php/BIBECHANA/article/view/29222
_version_ 1797194022871105536
author Jagadish Bhattarai
author_facet Jagadish Bhattarai
author_sort Jagadish Bhattarai
collection DOAJ
description Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corrosion resistance effects of showing very low corrosion rates, even lower than both alloying metals of the deposits. The average corrosion rates of these three tungsten-based sputter deposits found to be more than five orders of magnitude (between 3.1 × 10−3 and 7.2 × 10−3 mm/y) to that of chromium and also nearly one order of magnitude lower than that of tungsten metals. Such high corrosion resistance of the sputter-deposited W-xCr alloys is due to the formation of homogeneous passive double oxyhydroxide film consisting of Wox and Cr4+ cations without any concentration gradient in-depth after immersion in 12 M HCl solution open to air at 30 °C from the study of the non-destructive depth profiling technique of AR-XPS. Consequently, both alloying elements of tungsten and niobium are acted synergistically in enhancing the high corrosion resistance properties of the alloys in such aggressive electrolyte. BIBECHANA 18 (1) (2021) 201-213
first_indexed 2024-04-24T05:49:41Z
format Article
id doaj.art-048d6896777144bf81d2f180b5e2b719
institution Directory Open Access Journal
issn 2091-0762
2382-5340
language English
last_indexed 2024-04-24T05:49:41Z
publishDate 2021-01-01
publisher Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University
record_format Article
series Bibechana
spelling doaj.art-048d6896777144bf81d2f180b5e2b7192024-04-23T13:05:09ZengDepartment of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan UniversityBibechana2091-07622382-53402021-01-0118110.3126/bibechana.v18i1.29222An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solutionJagadish Bhattarai0Central Department of Chemistry, Tribhuvan University, Kirtipur, Kathmandu Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corrosion resistance effects of showing very low corrosion rates, even lower than both alloying metals of the deposits. The average corrosion rates of these three tungsten-based sputter deposits found to be more than five orders of magnitude (between 3.1 × 10−3 and 7.2 × 10−3 mm/y) to that of chromium and also nearly one order of magnitude lower than that of tungsten metals. Such high corrosion resistance of the sputter-deposited W-xCr alloys is due to the formation of homogeneous passive double oxyhydroxide film consisting of Wox and Cr4+ cations without any concentration gradient in-depth after immersion in 12 M HCl solution open to air at 30 °C from the study of the non-destructive depth profiling technique of AR-XPS. Consequently, both alloying elements of tungsten and niobium are acted synergistically in enhancing the high corrosion resistance properties of the alloys in such aggressive electrolyte. BIBECHANA 18 (1) (2021) 201-213 https://www.nepjol.info/index.php/BIBECHANA/article/view/29222Non-destructiveAngle-resolved XPSIn-depth analysisCorrosion-resistantW-based sputter deposits
spellingShingle Jagadish Bhattarai
An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
Bibechana
Non-destructive
Angle-resolved XPS
In-depth analysis
Corrosion-resistant
W-based sputter deposits
title An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
title_full An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
title_fullStr An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
title_full_unstemmed An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
title_short An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
title_sort overview on the non destructive in depth surface analysis of corrosion resistant films a case study of w xcr deposits in 12 m hcl solution
topic Non-destructive
Angle-resolved XPS
In-depth analysis
Corrosion-resistant
W-based sputter deposits
url https://www.nepjol.info/index.php/BIBECHANA/article/view/29222
work_keys_str_mv AT jagadishbhattarai anoverviewonthenondestructiveindepthsurfaceanalysisofcorrosionresistantfilmsacasestudyofwxcrdepositsin12mhclsolution
AT jagadishbhattarai overviewonthenondestructiveindepthsurfaceanalysisofcorrosionresistantfilmsacasestudyofwxcrdepositsin12mhclsolution