An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution
Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corr...
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Format: | Article |
Language: | English |
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Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University
2021-01-01
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Series: | Bibechana |
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Online Access: | https://www.nepjol.info/index.php/BIBECHANA/article/view/29222 |
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author | Jagadish Bhattarai |
author_facet | Jagadish Bhattarai |
author_sort | Jagadish Bhattarai |
collection | DOAJ |
description |
Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corrosion resistance effects of showing very low corrosion rates, even lower than both alloying metals of the deposits. The average corrosion rates of these three tungsten-based sputter deposits found to be more than five orders of magnitude (between 3.1 × 10−3 and 7.2 × 10−3 mm/y) to that of chromium and also nearly one order of magnitude lower than that of tungsten metals. Such high corrosion resistance of the sputter-deposited W-xCr alloys is due to the formation of homogeneous passive double oxyhydroxide film consisting of Wox and Cr4+ cations without any concentration gradient in-depth after immersion in 12 M HCl solution open to air at 30 °C from the study of the non-destructive depth profiling technique of AR-XPS. Consequently, both alloying elements of tungsten and niobium are acted synergistically in enhancing the high corrosion resistance properties of the alloys in such aggressive electrolyte.
BIBECHANA 18 (1) (2021) 201-213
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first_indexed | 2024-04-24T05:49:41Z |
format | Article |
id | doaj.art-048d6896777144bf81d2f180b5e2b719 |
institution | Directory Open Access Journal |
issn | 2091-0762 2382-5340 |
language | English |
last_indexed | 2024-04-24T05:49:41Z |
publishDate | 2021-01-01 |
publisher | Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University |
record_format | Article |
series | Bibechana |
spelling | doaj.art-048d6896777144bf81d2f180b5e2b7192024-04-23T13:05:09ZengDepartment of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan UniversityBibechana2091-07622382-53402021-01-0118110.3126/bibechana.v18i1.29222An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solutionJagadish Bhattarai0Central Department of Chemistry, Tribhuvan University, Kirtipur, Kathmandu Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corrosion resistance effects of showing very low corrosion rates, even lower than both alloying metals of the deposits. The average corrosion rates of these three tungsten-based sputter deposits found to be more than five orders of magnitude (between 3.1 × 10−3 and 7.2 × 10−3 mm/y) to that of chromium and also nearly one order of magnitude lower than that of tungsten metals. Such high corrosion resistance of the sputter-deposited W-xCr alloys is due to the formation of homogeneous passive double oxyhydroxide film consisting of Wox and Cr4+ cations without any concentration gradient in-depth after immersion in 12 M HCl solution open to air at 30 °C from the study of the non-destructive depth profiling technique of AR-XPS. Consequently, both alloying elements of tungsten and niobium are acted synergistically in enhancing the high corrosion resistance properties of the alloys in such aggressive electrolyte. BIBECHANA 18 (1) (2021) 201-213 https://www.nepjol.info/index.php/BIBECHANA/article/view/29222Non-destructiveAngle-resolved XPSIn-depth analysisCorrosion-resistantW-based sputter deposits |
spellingShingle | Jagadish Bhattarai An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution Bibechana Non-destructive Angle-resolved XPS In-depth analysis Corrosion-resistant W-based sputter deposits |
title | An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution |
title_full | An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution |
title_fullStr | An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution |
title_full_unstemmed | An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution |
title_short | An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution |
title_sort | overview on the non destructive in depth surface analysis of corrosion resistant films a case study of w xcr deposits in 12 m hcl solution |
topic | Non-destructive Angle-resolved XPS In-depth analysis Corrosion-resistant W-based sputter deposits |
url | https://www.nepjol.info/index.php/BIBECHANA/article/view/29222 |
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