The Importance of Nitric Oxide as the Molecular Basis of the Hydrogen Gas Fumigation-Induced Alleviation of Cd Stress on <i>Ganoderma lucidum</i>

The Importance of Nitric Oxide as the Molecular Basis of the Hydrogen Gas Fumigation-Induced Alleviation of Cd Stress on <i>Ganoderma lucidum</i>

Whether or not hydrogen gas (H<sub>2</sub>) can reduce cadmium (Cd) toxicity in <i>Ganoderma lucidum</i> has remained largely unknown. Here, we report that Cd-induced growth inhibition in <i>G. lucidum</i> was significantly alleviated by H<sub>2</sub>...

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Bibliographic Details
Main Authors: Dyaaaldin Abdalmegeed, Gan Zhao, Pengfei Cheng, Javaid A. Bhat, Wajid Ali Khattak, Mostafa G. Ali, Fawze Alnadari, Ilyas Ali, Qurban Ali, Sameh A. Korma, Yehia A.-G. Mahmoud, Manar K. Abd Elnabi, Weiti Cui, Wenbiao Shen
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Journal of Fungi
Subjects:
hydrogen fumigation
nitric oxide
hydrogen-rich water
stress alleviation
cysteine
proline
Online Access:https://www.mdpi.com/2309-608X/8/1/10

Internet

https://www.mdpi.com/2309-608X/8/1/10

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