Impact of thermal oxidation on the electrical transport and chemical & electronic structure of the GaN film grown on Si and sapphire substrates
Gallium oxide (Ga2O3) has emerged as a fourth-generation semiconductor for futuristic device requirements. Integration of Ga2O3 with industry-viable gallium nitride (GaN) can provide a pathway to design efficient device technology. In this paper, we design Ga2O3/GaN heterointerface by using a simple...
Main Authors: | , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2021-09-01
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Series: | Applied Surface Science Advances |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2666523921000520 |