Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method

Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method

We demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispers...

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Bibliographic Details
Main Authors: Jing-Yi Zhong, Jian-Jie Wang, Fan-Yi Ouyang
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Materials
Subjects:
medium entropy alloys
nanotwinned structure
magnetron sputtering
Taguchi method
CoCrFeNi thin films
Online Access:https://www.mdpi.com/1996-1944/15/22/8238

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https://www.mdpi.com/1996-1944/15/22/8238

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