Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method
We demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispers...
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MDPI AG
2022-11-01
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| Online Access: | https://www.mdpi.com/1996-1944/15/22/8238 |
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| author | Jing-Yi Zhong Jian-Jie Wang Fan-Yi Ouyang |
| author_facet | Jing-Yi Zhong Jian-Jie Wang Fan-Yi Ouyang |
| author_sort | Jing-Yi Zhong |
| collection | DOAJ |
| description | We demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispersive X-ray spectroscopy (EDS), an X-ray diffractometer (XRD) and a transmission electron microscope (TEM). Abundant nanotwins and the dual face-centered cubic−hexagonal close-packed (FCC-HCP) phases were formed in some specimens. The Taguchi experimental method and analysis of variance (ANOVA) were applied to find the optimized parameters. The control factors are five deposition parameters: substrate bias, substrate temperature, working pressure, rotation speed and pulsed frequency. According to the signal-to-noise ratio results, the optimized parameters for low electrical resistivity (98.2 ± 0.8 μΩ·cm), low surface roughness (0.5 ± 0.1 nm) and high hardness (9.3 ± 0.2 GPa) were achieved and verified with confirmed experiments. |
| first_indexed | 2024-03-09T18:11:27Z |
| format | Article |
| id | doaj.art-071d705e7eb247d9bc48c8f4e79124dc |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-09T18:11:27Z |
| publishDate | 2022-11-01 |
| publisher | MDPI AG |
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| spelling | doaj.art-071d705e7eb247d9bc48c8f4e79124dc2023-11-24T09:06:24ZengMDPI AGMaterials1996-19442022-11-011522823810.3390/ma15228238Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi MethodJing-Yi Zhong0Jian-Jie Wang1Fan-Yi Ouyang2Department of Engineering and System Science, National Tsing Hua University, Hsinchu 300044, TaiwanDepartment of Engineering and System Science, National Tsing Hua University, Hsinchu 300044, TaiwanDepartment of Engineering and System Science, National Tsing Hua University, Hsinchu 300044, TaiwanWe demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispersive X-ray spectroscopy (EDS), an X-ray diffractometer (XRD) and a transmission electron microscope (TEM). Abundant nanotwins and the dual face-centered cubic−hexagonal close-packed (FCC-HCP) phases were formed in some specimens. The Taguchi experimental method and analysis of variance (ANOVA) were applied to find the optimized parameters. The control factors are five deposition parameters: substrate bias, substrate temperature, working pressure, rotation speed and pulsed frequency. According to the signal-to-noise ratio results, the optimized parameters for low electrical resistivity (98.2 ± 0.8 μΩ·cm), low surface roughness (0.5 ± 0.1 nm) and high hardness (9.3 ± 0.2 GPa) were achieved and verified with confirmed experiments.https://www.mdpi.com/1996-1944/15/22/8238medium entropy alloysnanotwinned structuremagnetron sputteringTaguchi methodCoCrFeNi thin films |
| spellingShingle | Jing-Yi Zhong Jian-Jie Wang Fan-Yi Ouyang Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method Materials medium entropy alloys nanotwinned structure magnetron sputtering Taguchi method CoCrFeNi thin films |
| title | Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method |
| title_full | Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method |
| title_fullStr | Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method |
| title_full_unstemmed | Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method |
| title_short | Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method |
| title_sort | optimization of sputtering process for medium entropy alloy nanotwinned cocrfeni thin films by taguchi method |
| topic | medium entropy alloys nanotwinned structure magnetron sputtering Taguchi method CoCrFeNi thin films |
| url | https://www.mdpi.com/1996-1944/15/22/8238 |
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