Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films
Ti6Al4V thin film was prepared on glass substrate by RF sputtering method. The effect of RF power on the optical properties of the thin films has been investigated using UV-visible Spectrophotometer. It's found that the absorbance and the extinction coefficient (k) for deposited thin films inc...
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| Format: | Article |
| Language: | English |
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University of Baghdad
2019-01-01
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| Series: | Iraqi Journal of Physics |
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| Online Access: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/142 |