Structural and dielectric studies of Co doped MgTiO3 thin films fabricated by RF magnetron sputtering
We report the structural, dielectric and leakage current properties of Co doped MgTiO3 thin films deposited on platinized silicon (Pt/TiO2/SiO2/Si) substrates by RF magnetron sputtering. The role of oxygen mixing percentage (OMP) on the growth, morphology, electrical and dielectric properties of the...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2014-06-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4886379 |