Performance optimization of high-K pocket hetero-dielectric TFET using improved geometry design

This study explores the optimization of a hetero-dielectric tunnel field-effect transistor (HDTFET) structure to improve device performance. By incorporating a high-k oxide pocket in a portion of the source-side gate insulator, a local minimum in the conduction band edge is induced at the source-cha...

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Bibliographic Details
Main Authors: Abdelrahman Elshamy, Ahmed Shaker, Yasmine Elogail, Marwa S. Salem, Mona El Sabbagh
Format: Article
Language:English
Published: Elsevier 2024-03-01
Series:Alexandria Engineering Journal
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S1110016824001169

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