Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography

Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography

Abstract Continuing extreme downscaling of semiconductor devices, essential for high performance and energy efficiency of future microelectronics, hinges on extreme ultraviolet lithography (EUVL) and addressing associated challenges. One of such challenges is a need for improved EUV photoresists fea...

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Bibliographic Details
Main Authors: Ashwanth Subramanian, Nikhil Tiwale, Won‐Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang‐Yong Nam
Format: Article
Language:English
Published: Wiley-VCH 2023-10-01
Series:Advanced Materials Interfaces
Subjects:
electron beam lithography
extreme ultraviolet lithography
organic–inorganic hybrid
photoresist
vapor‐phase infiltration
Online Access:https://doi.org/10.1002/admi.202300420

Internet

https://doi.org/10.1002/admi.202300420

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