Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure betwe...

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Bibliographic Details
Main Authors: Ga Eul Kim, Hyuntae Kim, Kyoohee Woo, Yousung Kang, Seung-Hyun Lee, Yongho Jeon, Moon G. Lee, Sin Kwon
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Applied Sciences
Subjects:
roller bending
contact pressure
roll-to-roll process
nanoimprint lithography
high productivity
Online Access:https://www.mdpi.com/2076-3417/11/20/9571

Internet

https://www.mdpi.com/2076-3417/11/20/9571

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