Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth

Abstract In situ reflective high-energy electron diffraction (RHEED) is widely used to monitor the surface crystalline state during thin-film growth by molecular beam epitaxy (MBE) and pulsed laser deposition. With the recent development of machine learning (ML), ML-assisted analysis of RHEED videos...

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Main Authors: Hyuk Jin Kim, Minsu Chong, Tae Gyu Rhee, Yeong Gwang Khim, Min-Hyoung Jung, Young-Min Kim, Hu Young Jeong, Byoung Ki Choi, Young Jun Chang
Format: Article
Language:English
Published: SpringerOpen 2023-02-01
Series:Nano Convergence
Subjects:
Online Access:https://doi.org/10.1186/s40580-023-00359-5
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author Hyuk Jin Kim
Minsu Chong
Tae Gyu Rhee
Yeong Gwang Khim
Min-Hyoung Jung
Young-Min Kim
Hu Young Jeong
Byoung Ki Choi
Young Jun Chang
author_facet Hyuk Jin Kim
Minsu Chong
Tae Gyu Rhee
Yeong Gwang Khim
Min-Hyoung Jung
Young-Min Kim
Hu Young Jeong
Byoung Ki Choi
Young Jun Chang
author_sort Hyuk Jin Kim
collection DOAJ
description Abstract In situ reflective high-energy electron diffraction (RHEED) is widely used to monitor the surface crystalline state during thin-film growth by molecular beam epitaxy (MBE) and pulsed laser deposition. With the recent development of machine learning (ML), ML-assisted analysis of RHEED videos aids in interpreting the complete RHEED data of oxide thin films. The quantitative analysis of RHEED data allows us to characterize and categorize the growth modes step by step, and extract hidden knowledge of the epitaxial film growth process. In this study, we employed the ML-assisted RHEED analysis method to investigate the growth of 2D thin films of transition metal dichalcogenides (ReSe2) on graphene substrates by MBE. Principal component analysis (PCA) and K-means clustering were used to separate statistically important patterns and visualize the trend of pattern evolution without any notable loss of information. Using the modified PCA, we could monitor the diffraction intensity of solely the ReSe2 layers by filtering out the substrate contribution. These findings demonstrate that ML analysis can be successfully employed to examine and understand the film-growth dynamics of 2D materials. Further, the ML-based method can pave the way for the development of advanced real-time monitoring and autonomous material synthesis techniques. Graphical Abstract
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spelling doaj.art-0a52db1997a54afe9cfa88f83f03424b2023-03-22T12:02:54ZengSpringerOpenNano Convergence2196-54042023-02-0110111010.1186/s40580-023-00359-5Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growthHyuk Jin Kim0Minsu Chong1Tae Gyu Rhee2Yeong Gwang Khim3Min-Hyoung Jung4Young-Min Kim5Hu Young Jeong6Byoung Ki Choi7Young Jun Chang8Department of Physics, University of SeoulDepartment of Physics, University of SeoulDepartment of Physics, University of SeoulDepartment of Physics, University of SeoulDepartment of Energy Science, Sungkyunkwan University (SKKU)Department of Energy Science, Sungkyunkwan University (SKKU)Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST)Department of Physics, University of SeoulDepartment of Physics, University of SeoulAbstract In situ reflective high-energy electron diffraction (RHEED) is widely used to monitor the surface crystalline state during thin-film growth by molecular beam epitaxy (MBE) and pulsed laser deposition. With the recent development of machine learning (ML), ML-assisted analysis of RHEED videos aids in interpreting the complete RHEED data of oxide thin films. The quantitative analysis of RHEED data allows us to characterize and categorize the growth modes step by step, and extract hidden knowledge of the epitaxial film growth process. In this study, we employed the ML-assisted RHEED analysis method to investigate the growth of 2D thin films of transition metal dichalcogenides (ReSe2) on graphene substrates by MBE. Principal component analysis (PCA) and K-means clustering were used to separate statistically important patterns and visualize the trend of pattern evolution without any notable loss of information. Using the modified PCA, we could monitor the diffraction intensity of solely the ReSe2 layers by filtering out the substrate contribution. These findings demonstrate that ML analysis can be successfully employed to examine and understand the film-growth dynamics of 2D materials. Further, the ML-based method can pave the way for the development of advanced real-time monitoring and autonomous material synthesis techniques. Graphical Abstracthttps://doi.org/10.1186/s40580-023-00359-5Machine learningRHEEDPrincipal component analysisK-means clusteringTMDCReSe2
spellingShingle Hyuk Jin Kim
Minsu Chong
Tae Gyu Rhee
Yeong Gwang Khim
Min-Hyoung Jung
Young-Min Kim
Hu Young Jeong
Byoung Ki Choi
Young Jun Chang
Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
Nano Convergence
Machine learning
RHEED
Principal component analysis
K-means clustering
TMDC
ReSe2
title Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
title_full Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
title_fullStr Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
title_full_unstemmed Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
title_short Machine-learning-assisted analysis of transition metal dichalcogenide thin-film growth
title_sort machine learning assisted analysis of transition metal dichalcogenide thin film growth
topic Machine learning
RHEED
Principal component analysis
K-means clustering
TMDC
ReSe2
url https://doi.org/10.1186/s40580-023-00359-5
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