The Influence of Argon Cluster Ion Bombardment on the Characteristics of AlN Films on Glass-Ceramics and Si Substrates

The Influence of Argon Cluster Ion Bombardment on the Characteristics of AlN Films on Glass-Ceramics and Si Substrates

In this paper, the influence of surface modification on the characteristics and properties of AlN thin films on Si and glass-ceramics substrates is investigated. The surface modification was made at various parameters of argon cluster ions. By using XRD and Raman spectroscopy, it was shown that the...

Full description

Bibliographic Details
Main Authors: Ivan V. Nikolaev, Pavel V. Geydt, Nikolay G. Korobeishchikov, Aleksandr V. Kapishnikov, Vladimir A. Volodin, Ivan A. Azarov, Vladimir I. Strunin, Evgeny Y. Gerasimov
Format: Article
Language:English
Published: MDPI AG 2022-02-01
Series:Nanomaterials
Subjects:
aluminum nitride
thin films
gas cluster ion beam
surface smoothing
material characterization
Online Access:https://www.mdpi.com/2079-4991/12/4/670

Internet

https://www.mdpi.com/2079-4991/12/4/670

Similar Items