Wafer Surface Reconstruction Based on Shape From Focus

Wafer Surface Reconstruction Based on Shape From Focus

Scanning electron microscope, atomic force microscope and other equipment play an important role in the fields of topography restoration and detection. However, these devices are generally used in nanometer-scale measurement scenarios. For wafer topography quality control scenarios ranging from micr...

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Bibliographic Details
Main Authors: Shaohang Wang, Jiqiang Chen, Hua Shi, Mingye Li
Format: Article
Language:English
Published: IEEE 2024-01-01
Series:IEEE Access
Subjects:
Wafer
shape from focus
Levy filtering
defect detection
Online Access:https://ieeexplore.ieee.org/document/10433512/

Internet

https://ieeexplore.ieee.org/document/10433512/

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