High figure-of-merit SOI power LDMOS for power integrated circuits
The structural modifications in the conventional power laterally diffused metal-oxide-semiconductor field-effect transistor (LDMOS) are carried out to improve the breakdown voltage, on-resistance, gate-charge and figure-of-merits of the device with reduced cell pitch. The modified device has planer...
Main Authors: | , |
---|---|
Format: | Article |
Language: | English |
Published: |
Elsevier
2015-06-01
|
Series: | Engineering Science and Technology, an International Journal |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2215098614000895 |