Study on plasma cleaning of surface contaminants on pure copper
To demonstrate the relationship between the type of working gas and the efficiency of plasma cleaning, the kinetic energy of the incident ions was controlled by adjusting the bias, and the effect of different ion sources on the sputtering yield under the same bias was compared. The plasma flow gener...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2023-01-01
|
| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/acac61 |