Design and Analysis of a New Excitation Structure for Magnetron Sputtering
Magnetron sputtering systems are widely used for depositing industrially important coatings. Research has been conducted to optimize and improve these structures to increase coating effectiveness and target utilization. The paper investigates the engineering problem of uneven target etching caused b...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2024-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10526228/ |