Fabrication of low-loss SOI nano-waveguides including BEOL processes for nonlinear applications

We report successful fabrication of low-loss SOI nano-waveguides with integrated PIN diode structures. The entire fabrication process is done on a 200 mm BiCMOS toolset using front-end-of-line (FEOL) and back-end-of-line (BEOL) processes and does not show any undesirable influence upon the photonic...

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Bibliographic Details
Main Authors: Tian H., Winzer G., Gajda A., Petermann K., Tillack B., Zimmermann L.
Format: Article
Language:English
Published: EDP Sciences 2012-01-01
Series:Journal of the European Optical Society-Rapid Publications
Subjects:
Online Access:https://jeos.edpsciences.org/articles/jeos/pdf/2012/01/jeos20120712032.pdf