Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti<sub>2</sub>N Films Deposited by RF-Magnetron Sputtering

Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti<sub>2</sub>N Films Deposited by RF-Magnetron Sputtering

The titanium nitride (Ti<sub>2</sub>N) films have good mechanical properties, such as high hardness and chemical stability, giving Ti<sub>2</sub>N good resistance to wear and corrosion. The properties of films deposited by PVD techniques are determined by their structure, mic...

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Bibliographic Details
Main Authors: Andrés González-Hernández, William Aperador, Martín Flores, Edgar Onofre-Bustamante, Juan E. Bermea, Roberto Bautista-García, Federico Gamboa-Soto
Format: Article
Language:English
Published: MDPI AG 2022-07-01
Series:Metals
Subjects:
Ti<sub>2</sub>N films
RF-magnetron sputtering
deposition parameters
structural and electrochemical properties
Online Access:https://www.mdpi.com/2075-4701/12/8/1237

Internet

https://www.mdpi.com/2075-4701/12/8/1237

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