Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits
In the presented work the technological parameters that influence the shape of the resist structures are reported. The experimental results are compared with the simulations results, based on the solution of Maxwell’s equations using the RF module of COMSOL Multiphysics software. The electric field...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
VSB-Technical University of Ostrava
2020-01-01
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| Series: | Advances in Electrical and Electronic Engineering |
| Subjects: | |
| Online Access: | http://advances.utc.sk/index.php/AEEE/article/view/3723 |