Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits
In the presented work the technological parameters that influence the shape of the resist structures are reported. The experimental results are compared with the simulations results, based on the solution of Maxwell’s equations using the RF module of COMSOL Multiphysics software. The electric field...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
VSB-Technical University of Ostrava
2020-01-01
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| Series: | Advances in Electrical and Electronic Engineering |
| Subjects: | |
| Online Access: | http://advances.utc.sk/index.php/AEEE/article/view/3723 |
| _version_ | 1797826946908815360 |
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| author | Agnieszka Zawadzka Kornelia Indykiewicz Regina Paszkiewicz |
| author_facet | Agnieszka Zawadzka Kornelia Indykiewicz Regina Paszkiewicz |
| author_sort | Agnieszka Zawadzka |
| collection | DOAJ |
| description | In the presented work the technological parameters that influence the shape of the resist structures are reported. The experimental results are compared with the simulations results, based on the solution of Maxwell’s equations using the RF module of COMSOL Multiphysics software. The electric field intensity distribution in the resist layer was analyzed for the mask slits that are larger and comparable to the applied wavelength. The differences in wave energy absorption in the resist layer are presented and discussed. For both cases, the impact of the chromium film thickness of the mask on the pattern profile of the resist is studied and the comparison is performed between the simulation and experimental results. |
| first_indexed | 2024-04-09T12:40:26Z |
| format | Article |
| id | doaj.art-12d0dfdcabba4c21be72f0c210c9e121 |
| institution | Directory Open Access Journal |
| issn | 1336-1376 1804-3119 |
| language | English |
| last_indexed | 2024-04-09T12:40:26Z |
| publishDate | 2020-01-01 |
| publisher | VSB-Technical University of Ostrava |
| record_format | Article |
| series | Advances in Electrical and Electronic Engineering |
| spelling | doaj.art-12d0dfdcabba4c21be72f0c210c9e1212023-05-14T20:50:13ZengVSB-Technical University of OstravaAdvances in Electrical and Electronic Engineering1336-13761804-31192020-01-0118211512110.15598/aeee.v18i2.37231087Qualitative Assessment of the UV Exposition Process Near the Diffraction LimitsAgnieszka Zawadzka0Kornelia Indykiewicz1Regina Paszkiewicz2Wroclaw University of Science and TechnologyWroclaw University of Science and TechnologyWroclaw University of Science and TechnologyIn the presented work the technological parameters that influence the shape of the resist structures are reported. The experimental results are compared with the simulations results, based on the solution of Maxwell’s equations using the RF module of COMSOL Multiphysics software. The electric field intensity distribution in the resist layer was analyzed for the mask slits that are larger and comparable to the applied wavelength. The differences in wave energy absorption in the resist layer are presented and discussed. For both cases, the impact of the chromium film thickness of the mask on the pattern profile of the resist is studied and the comparison is performed between the simulation and experimental results.http://advances.utc.sk/index.php/AEEE/article/view/3723uv expositiondiffraction limitssimulations |
| spellingShingle | Agnieszka Zawadzka Kornelia Indykiewicz Regina Paszkiewicz Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits Advances in Electrical and Electronic Engineering uv exposition diffraction limits simulations |
| title | Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits |
| title_full | Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits |
| title_fullStr | Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits |
| title_full_unstemmed | Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits |
| title_short | Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits |
| title_sort | qualitative assessment of the uv exposition process near the diffraction limits |
| topic | uv exposition diffraction limits simulations |
| url | http://advances.utc.sk/index.php/AEEE/article/view/3723 |
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