Measurement of Wafer Focus by Grating Shearing Interferometry
A method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured by testing the phase difference in the interference pattern. To...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2020-10-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/10/21/7467 |
| _version_ | 1797549954112159744 |
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| author | Jian Wang Song Hu Xianchang Zhu |
| author_facet | Jian Wang Song Hu Xianchang Zhu |
| author_sort | Jian Wang |
| collection | DOAJ |
| description | A method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured by testing the phase difference in the interference pattern. To validate the feasibility, an experiment is implemented, of which the measurement precision is indicated as 30 nm due to the high precision of phase-resolving arithmetic after analyzing the measurement uncertainty and indicating the precision by interferometer. |
| first_indexed | 2024-03-10T15:22:22Z |
| format | Article |
| id | doaj.art-13f1eaced9cb4dcfb7f49216e48d8b25 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-03-10T15:22:22Z |
| publishDate | 2020-10-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Sciences |
| spelling | doaj.art-13f1eaced9cb4dcfb7f49216e48d8b252023-11-20T18:20:14ZengMDPI AGApplied Sciences2076-34172020-10-011021746710.3390/app10217467Measurement of Wafer Focus by Grating Shearing InterferometryJian Wang0Song Hu1Xianchang Zhu2University of The Chinese Academy of Science, Beijing 100864, ChinaInstitute of Optics and Electronics, The Chinese Academy of Science, Chengdu 610209, ChinaInstitute of Optics and Electronics, The Chinese Academy of Science, Chengdu 610209, ChinaA method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured by testing the phase difference in the interference pattern. To validate the feasibility, an experiment is implemented, of which the measurement precision is indicated as 30 nm due to the high precision of phase-resolving arithmetic after analyzing the measurement uncertainty and indicating the precision by interferometer.https://www.mdpi.com/2076-3417/10/21/7467focusinggratingshearing interferometrylithography |
| spellingShingle | Jian Wang Song Hu Xianchang Zhu Measurement of Wafer Focus by Grating Shearing Interferometry Applied Sciences focusing grating shearing interferometry lithography |
| title | Measurement of Wafer Focus by Grating Shearing Interferometry |
| title_full | Measurement of Wafer Focus by Grating Shearing Interferometry |
| title_fullStr | Measurement of Wafer Focus by Grating Shearing Interferometry |
| title_full_unstemmed | Measurement of Wafer Focus by Grating Shearing Interferometry |
| title_short | Measurement of Wafer Focus by Grating Shearing Interferometry |
| title_sort | measurement of wafer focus by grating shearing interferometry |
| topic | focusing grating shearing interferometry lithography |
| url | https://www.mdpi.com/2076-3417/10/21/7467 |
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