Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen

Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen

Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...

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Bibliographic Details
Main Authors: Shiyong Huang, Zhi Kai Ng, Hongling Li, Apoorva Chaturvedi, Jian Wei Mark Lim, Roland Yingjie Tay, Edwin Hang Tong Teo, Shuyan Xu, Kostya (Ken) Ostrikov, Siu Hon Tsang
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Nanomaterials
Subjects:
inductively coupled plasmas
chemical vapor deposition
boron nitride
protective layer
ion bombardment
atomic oxygen
Online Access:https://www.mdpi.com/2079-4991/12/21/3876

Internet

https://www.mdpi.com/2079-4991/12/21/3876

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