Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering

Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering

Zr-Si-N thin films were co-deposited by reactive magnetron sputtering to verify the influence of silicon content (1.6 and 8.0 at. % Si) and substrate temperature (room temperature and heated to 973 K) on structure, morphology, chemical bonds and hardness. GAXRD shows a change in grain orientation fr...

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Bibliographic Details
Main Authors: F.S. Oliveira, I.L. Dias, P.L.L. Araújo, D.A. Ramirez, P.C. Silva Neto, R. Hübler, F.M.T. Mendes, I.Z. Damasceno, E.K. Tentardini
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2023-10-01
Series:Materials Research
Subjects:
thin films
solid solution
substrate heating
ZrN
Si3N4
reactive magnetron sputtering
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100310&lng=en&tlng=en

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