Monte Carlo and Kinetic Monte Carlo Models for Deposition Processes: A Review of Recent Works

Monte Carlo and Kinetic Monte Carlo Models for Deposition Processes: A Review of Recent Works

Monte Carlo (MC) and kinetic Monte Carlo (kMC) models are widely used for studying the physicochemical surface phenomena encountered in most deposition processes. This spans from physical and chemical vapor deposition to atomic layer and electrochemical deposition. MC and kMC, in comparison to popul...

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Bibliographic Details
Main Authors: Nikolaos Cheimarios, Deifilia To, George Kokkoris, George Memos, Andreas G. Boudouvis
Format: Article
Language:English
Published: Frontiers Media S.A. 2021-04-01
Series:Frontiers in Physics
Subjects:
physical vapor deposition
chemical vapor deposition
atomic layer deposition
electrochemical deposition
nanorods
graphene
Online Access:https://www.frontiersin.org/articles/10.3389/fphy.2021.631918/full

Internet

https://www.frontiersin.org/articles/10.3389/fphy.2021.631918/full

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