Photolithography of SU-8 microtowers for a 100-turn, 3-D toroidal microinductor

Photolithography of SU-8 microtowers for a 100-turn, 3-D toroidal microinductor

Abstract We present a photolithography scheme for ultra-tall, high-aspect-ratio microstructures. While increased height of microstructures can expand the design capability of various microdevices, it has been challenging to achieve the ultra-tall microstructure, 1 mm or higher, using a well-known ne...

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Bibliographic Details
Main Authors: Jungkwun J. K. Kim, Hassan Al Thuwaini, Mohammad Almuslem
Format: Article
Language:English
Published: SpringerOpen 2018-12-01
Series:Micro and Nano Systems Letters
Subjects:
Microtower
3-D toroid inductor
High-aspect ratio
SU-8
Online Access:http://link.springer.com/article/10.1186/s40486-018-0076-z

Internet

http://link.springer.com/article/10.1186/s40486-018-0076-z

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