Photolithography of SU-8 microtowers for a 100-turn, 3-D toroidal microinductor
Abstract We present a photolithography scheme for ultra-tall, high-aspect-ratio microstructures. While increased height of microstructures can expand the design capability of various microdevices, it has been challenging to achieve the ultra-tall microstructure, 1 mm or higher, using a well-known ne...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2018-12-01
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| Series: | Micro and Nano Systems Letters |
| Subjects: | |
| Online Access: | http://link.springer.com/article/10.1186/s40486-018-0076-z |