Influence of aluminum ion on the structural, optical, and electrical properties of CuO thin films for the PN-Junction diode application

Pure and (1, 3, and 5 wt%) Aluminum-doped copper oxide(Al:CuO) thin films were prepared using the JNS spray-pyrolysis technique using analytical grade copper chloride and aluminum chloride as a precursor. The monoclinic structure of the CuO film has been confirmed by an X-ray diffraction (XRD) study...

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Bibliographic Details
Main Authors: N. Jhansi, D. Balasubramanian, R. Raman, K. Mohanraj
Format: Article
Language:English
Published: KeAi Communications Co., Ltd. 2022-01-01
Series:Materials Science for Energy Technologies
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2589299122000258