Influence of aluminum ion on the structural, optical, and electrical properties of CuO thin films for the PN-Junction diode application
Pure and (1, 3, and 5 wt%) Aluminum-doped copper oxide(Al:CuO) thin films were prepared using the JNS spray-pyrolysis technique using analytical grade copper chloride and aluminum chloride as a precursor. The monoclinic structure of the CuO film has been confirmed by an X-ray diffraction (XRD) study...
Main Authors: | , , , |
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Format: | Article |
Language: | English |
Published: |
KeAi Communications Co., Ltd.
2022-01-01
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Series: | Materials Science for Energy Technologies |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2589299122000258 |