Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control
Integrating bottom-up and top-down fabrication techniques can overcome limits in nanofabrication. Here authors demonstrate an approach for area selective deposition using Ti as an inhibitor in the atomic layer deposition process to achieve controlled growth of seamless TiO2 layers on 3D structures.
| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2022-12-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-022-35428-6 |