Cross section sets and transport parameters for Ar+ ions in CF4 gas
Understanding plasma distribution, characteristics and phenomena is important for the development and optimization of semiconductor device manufacturing plasma equipment, such as etching and deposition tools. For this reason, plasma simulation is currently being utilized at every stage of equipment...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
International Institute for the Science of Sintering, Beograd
2024-01-01
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| Series: | Science of Sintering |
| Subjects: | |
| Online Access: | https://doiserbia.nb.rs/img/doi/0350-820X/2024/0350-820X2300038N.pdf |