A dual distance metrics method for improving classification performance
Abstract Distance metric forms the basis of pattern classification, as almost all classifiers depend on such a metric for making classification decisions. However, the existing research testifies that a single‐distance metric is not robust enough for classification. In this Letter, the authors propo...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2021-01-01
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| Series: | Electronics Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1049/ell2.12016 |