Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication
Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already been demonstrated. However, the FLISE technology st...
| Autori principali: | , , , |
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| Natura: | Articolo |
| Lingua: | English |
| Pubblicazione: |
MDPI AG
2020-05-01
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| Serie: | Micromachines |
| Soggetti: | |
| Accesso online: | https://www.mdpi.com/2072-666X/11/5/483 |