Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns
Abstract The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub−10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling proce...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2023-12-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-023-43766-2 |
| _version_ | 1797376891301134336 |
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| author | Junghyun Cho Jinwoo Oh Joona Bang Jai Hyun Koh Hoon Yeub Jeong Seungjun Chung Jeong Gon Son |
| author_facet | Junghyun Cho Jinwoo Oh Joona Bang Jai Hyun Koh Hoon Yeub Jeong Seungjun Chung Jeong Gon Son |
| author_sort | Junghyun Cho |
| collection | DOAJ |
| description | Abstract The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub−10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process. |
| first_indexed | 2024-03-08T19:45:07Z |
| format | Article |
| id | doaj.art-17f4295ef7d9429bb6353e4441317d48 |
| institution | Directory Open Access Journal |
| issn | 2041-1723 |
| language | English |
| last_indexed | 2024-03-08T19:45:07Z |
| publishDate | 2023-12-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj.art-17f4295ef7d9429bb6353e4441317d482023-12-24T12:23:41ZengNature PortfolioNature Communications2041-17232023-12-0114111010.1038/s41467-023-43766-2Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatternsJunghyun Cho0Jinwoo Oh1Joona Bang2Jai Hyun Koh3Hoon Yeub Jeong4Seungjun Chung5Jeong Gon Son6Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guSoft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guDepartment of Chemical and Biological Engineering, Korea University, Seongbuk-guClean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guSoft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guSoft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guSoft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-guAbstract The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub−10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process.https://doi.org/10.1038/s41467-023-43766-2 |
| spellingShingle | Junghyun Cho Jinwoo Oh Joona Bang Jai Hyun Koh Hoon Yeub Jeong Seungjun Chung Jeong Gon Son Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns Nature Communications |
| title | Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns |
| title_full | Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns |
| title_fullStr | Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns |
| title_full_unstemmed | Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns |
| title_short | Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns |
| title_sort | roll to plate 0 1 second shear rolling process at elevated temperature for highly aligned nanopatterns |
| url | https://doi.org/10.1038/s41467-023-43766-2 |
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