A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

Recently, considerable work has been directed at the development of an ultracompact X-ray free-electron laser (UCXFEL) based on emerging techniques in high-field cryogenic acceleration, with attendant dramatic improvements in electron beam brightness and state-of-the-art concepts in beam dynamics, m...

Full description

Bibliographic Details
Main Authors: James B. Rosenzweig, Gerard Andonian, Ronald Agustsson, Petr M. Anisimov, Aurora Araujo, Fabio Bosco, Martina Carillo, Enrica Chiadroni, Luca Giannessi, Zhirong Huang, Atsushi Fukasawa, Dongsung Kim, Sergey Kutsaev, Gerard Lawler, Zenghai Li, Nathan Majernik, Pratik Manwani, Jared Maxson, Janwei Miao, Mauro Migliorati, Andrea Mostacci, Pietro Musumeci, Alex Murokh, Emilio Nanni, Sean O’Tool, Luigi Palumbo, River Robles, Yusuke Sakai, Evgenya I. Simakov, Madison Singleton, Bruno Spataro, Jingyi Tang, Sami Tantawi, Oliver Williams, Haoran Xu, Monika Yadav
Format: Article
Language:English
Published: MDPI AG 2024-03-01
Series:Instruments
Subjects:
metrology
semiconductor
ptychography
laminography
free-electron laser
photoinjector
Online Access:https://www.mdpi.com/2410-390X/8/1/19

Internet

https://www.mdpi.com/2410-390X/8/1/19

Similar Items