Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces

Abstract Atom probes generate three‐dimensional atomic‐scale tomographies of material volumes corresponding to the size of modern‐day solid‐state devices. Here, the capabilities of atom probe tomography are evaluated to analyze buried interfaces in semiconductor heterostructures relevant for electro...

Full description

Bibliographic Details
Main Authors: Sebastian Koelling, Lucas E. A. Stehouwer, Brian Paquelet Wuetz, Giordano Scappucci, Oussama Moutanabbir
Format: Article
Language:English
Published: Wiley-VCH 2023-01-01
Series:Advanced Materials Interfaces
Subjects:
Online Access:https://doi.org/10.1002/admi.202201189
_version_ 1797730858078044160
author Sebastian Koelling
Lucas E. A. Stehouwer
Brian Paquelet Wuetz
Giordano Scappucci
Oussama Moutanabbir
author_facet Sebastian Koelling
Lucas E. A. Stehouwer
Brian Paquelet Wuetz
Giordano Scappucci
Oussama Moutanabbir
author_sort Sebastian Koelling
collection DOAJ
description Abstract Atom probes generate three‐dimensional atomic‐scale tomographies of material volumes corresponding to the size of modern‐day solid‐state devices. Here, the capabilities of atom probe tomography are evaluated to analyze buried interfaces in semiconductor heterostructures relevant for electronic and quantum devices. Employing brute‐force search, the current dominant reconstruction protocol to generate tomographic three‐dimensional images from Atom Probe data is advanced to its limits. Using Si/SiGe heterostructure for qubits as a model system, the authors show that it is possible to extract interface properties like roughness and width that agree with transmission electron microscopy observations on the sub‐nanometer scale in an automated and highly reproducible manner. The demonstrated approach is a versatile method for atomic‐scale characterization of buried interfaces in semiconductor heterostructures.
first_indexed 2024-03-12T11:50:18Z
format Article
id doaj.art-1a39ae026e9d41e3bc0b68c680f66182
institution Directory Open Access Journal
issn 2196-7350
language English
last_indexed 2024-03-12T11:50:18Z
publishDate 2023-01-01
publisher Wiley-VCH
record_format Article
series Advanced Materials Interfaces
spelling doaj.art-1a39ae026e9d41e3bc0b68c680f661822023-08-31T08:56:33ZengWiley-VCHAdvanced Materials Interfaces2196-73502023-01-01103n/an/a10.1002/admi.202201189Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor HeterointerfacesSebastian Koelling0Lucas E. A. Stehouwer1Brian Paquelet Wuetz2Giordano Scappucci3Oussama Moutanabbir4Department of Engineering Physics École Polytechnique de Montréal Succursale Centre‐Ville Montréal H3C 3A7 CanadaQuTech and Kavli Institute of Nanoscience Delft University of Technology Delft 2600 GA The NetherlandsQuTech and Kavli Institute of Nanoscience Delft University of Technology Delft 2600 GA The NetherlandsQuTech and Kavli Institute of Nanoscience Delft University of Technology Delft 2600 GA The NetherlandsDepartment of Engineering Physics École Polytechnique de Montréal Succursale Centre‐Ville Montréal H3C 3A7 CanadaAbstract Atom probes generate three‐dimensional atomic‐scale tomographies of material volumes corresponding to the size of modern‐day solid‐state devices. Here, the capabilities of atom probe tomography are evaluated to analyze buried interfaces in semiconductor heterostructures relevant for electronic and quantum devices. Employing brute‐force search, the current dominant reconstruction protocol to generate tomographic three‐dimensional images from Atom Probe data is advanced to its limits. Using Si/SiGe heterostructure for qubits as a model system, the authors show that it is possible to extract interface properties like roughness and width that agree with transmission electron microscopy observations on the sub‐nanometer scale in an automated and highly reproducible manner. The demonstrated approach is a versatile method for atomic‐scale characterization of buried interfaces in semiconductor heterostructures.https://doi.org/10.1002/admi.202201189atom probe tomographyatomic scale microscopyepitaxial interfacessemiconductor heterostructures
spellingShingle Sebastian Koelling
Lucas E. A. Stehouwer
Brian Paquelet Wuetz
Giordano Scappucci
Oussama Moutanabbir
Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
Advanced Materials Interfaces
atom probe tomography
atomic scale microscopy
epitaxial interfaces
semiconductor heterostructures
title Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
title_full Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
title_fullStr Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
title_full_unstemmed Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
title_short Three‐Dimensional Atomic‐Scale Tomography of Buried Semiconductor Heterointerfaces
title_sort three dimensional atomic scale tomography of buried semiconductor heterointerfaces
topic atom probe tomography
atomic scale microscopy
epitaxial interfaces
semiconductor heterostructures
url https://doi.org/10.1002/admi.202201189
work_keys_str_mv AT sebastiankoelling threedimensionalatomicscaletomographyofburiedsemiconductorheterointerfaces
AT lucaseastehouwer threedimensionalatomicscaletomographyofburiedsemiconductorheterointerfaces
AT brianpaqueletwuetz threedimensionalatomicscaletomographyofburiedsemiconductorheterointerfaces
AT giordanoscappucci threedimensionalatomicscaletomographyofburiedsemiconductorheterointerfaces
AT oussamamoutanabbir threedimensionalatomicscaletomographyofburiedsemiconductorheterointerfaces