Synthesis and corrosion resistance of Cu-Al-N nanostructured thin films deposited through magnetron sputtering
Cu-Al-N thin films were deposited by means of the unbalanced magnetron cosputtering technique, varying the pulsed DC source power that is associated with the aluminum target. The structural characterization, done through x ray difraction (XRD) and transmition electronic microscopy (TEM), showed that...
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2021-01-01
|
| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ac017c |